Waferpedia

Comparison ledger

2300 Selisversus1512e

Lam Research 2300 Selis, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
2300 SelisLam Research
1512eTegal
OEMLam ResearchTegal
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyLam Research 2300 SelisTegal 1512e
Cited variants
  • 2300 SELIS - Chamber Only[1]
—
Specifications
OEM / manufacturerLam Research[2]—
Model2300 Selis[2]—
Equipment typeEtch chamber[2]—
CategoryEtch[3]—
Wafer size12 inch[2]—
Process / descriptionDielectric Etch – Process Chamber[1]—
ConfigurationChamber Only[1]—
Version300 mm[1]—
Tool type—Industrial RIE plasma etcher system[4]
Stated configuration—With modules assembly for CI-4222[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]fabsurplus.comfabsurplus.com
  2. [2]Equipment inventory listing
  3. [3]waferpedia.comwaferpedia.com
  4. [4]semistarcorp.comsemistarcorp.com