Comparison ledger
KLA .496 PSL Wafer, Zeiss CrossBeam 550, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | CrossBeam 550Zeiss | |
|---|---|---|
| OEM | KLA | Zeiss |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | 6" |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | Windows |
| Generation | — | — |
| Family | KLA .496 PSL Wafer | Zeiss CrossBeam 550 |
| Specifications | ||
| Configuration | NIST Traceable[1] | — |
| Wafer size | 8 inch[1] | — |
| Traceability | NIST Traceable[1] | — |
| Compatible systems | Capable on Surfscan 6xy0 and SP1[1] | — |
| Category | Metrology & Inspection[2] | — |
| Column | — | GEMINI II electron optical column[3] |
| Stage | — | 5-axes motorized stage (X, Y, Z (M), Tilt and Rotation)[3] |
| Airlock | — | Semi-automatic airlock[3] |
| Vibration compensation | — | Active suspensions to compensate for vibrations[3] |
| Control software | — | Zeiss SmartSEM software[3] |
| Control interface | — | Controlled via a dual joystick and a dedicated control panel; PC with two monitors[3] |
| Detector | — | InLens SE detector[3] |
| Available software for offline analysis and metrology | — | ProSEM software, MountainsMap 8.2 (coupled to 3DSM Metrology), SmartStitch[3] |
| Reserved use | — | Exclusively reserved for imaging dedicated to control of processes done in CMi by regular CMi users[3] |
| Sample holders | — | Carousel 9x10mm, multi-pin holder, Wafer Section, 4 Inch Wafer, 6 Inch Wafer, 6 Inch Mask[3] |
| Column type | — | GEMINI II[3] |
| Electron source | — | Schottky field emitter[3] |
| Detectors | — | InLens SE, SE (Everhart-Thornley), EsB, aBSD, VPSE[3] |
| Software | — | Zeiss SmartSEM[3] |
| Active suspension | — | Yes, for vibration compensation[3] |
| Stage axes | — | X, Y, Z (M), Tilt, Rotation[3] |
| Beam booster | — | Yes, up to 20 kV[3] |
| Maximum acceleration voltage | — | 20 kV (with beam booster)[3] |
| Monitors | — | Two monitors[3] |
| Control | — | Dual joystick and control panel[3] |
| Gun type | — | Schottky field emitter[3] |
| Specimen holders | — | Carousel 9x10mm, multi-pin holder, Wafer Section, 4 Inch Wafer, 6 Inch Wafer, 6 Inch Mask[3] |
| Electron gun | — | Schottky field emitter[3] |
| Specimen transfer | — | Semi-automatic airlock for fast specimen transfer[3] |
| Electron optical column | — | GEMINI II[3] |
| Vibration isolation | — | Set of active suspensions for vibration compensation (always activated)[3] |
| aBSD detector | — | Pneumatically retractable annular backscattered electron detector with five separate diode segments (one inner concentric ring, four outer quadrants)[3] |
| VPSE detector | — | Variable Pressure Secondary Electron detector for imaging non-conductive specimens under variable pressure without extensive sample preparation[3] |
| EsB detector | — | Energy-selective backscattered detector enabling SE and BSE detection; annular shaped in-column detector located above the InLens SE detector[3] |
| SE detector | — | Everhart-Thornley type detector; collector voltage variable between -250 V and +400 V[3] |
| Chamber cameras | — | Chamber CCD camera at backside plus a second CCD camera on the left-hand side of the specimen chamber[3] |
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