Waferpedia

Comparison ledger

1.112 PSL WaferversusLeo 1530 FE-SEM

KLA 1.112 PSL Wafer, Zeiss Leo 1530 FE-SEM, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMKLAZeiss
CategoryMetrology & InspectionMetrology & Inspection
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyKLA 1.112 PSL WaferZeiss LEO
Specifications
ConfigurationNIST Traceable[1]Four-Quadrant Backscattered Electron Detector (4QBSD)[3]
Wafer Size8 inch[1]—
NIST TraceableTrue[1]—
Compatible ToolsSurfscan 6xy0 and Sp1[2]—
OXFORD 6901 EDX Detector with resolution—133 eV at 5.9 KeV[3]
Determination area—10 mm²[3]
Detectors—Four-Quadrant Backscattered Electron Detector (4QBSD), E-T Detector, In-lens detector[3]
EDX Detector—OXFORD 6901 EDX Detector with resolution 133 eV at 5.9 KeV, determination area 10 mm²[3]
Resolution—Sub-nanometer[4]
Voltage Range—0.2-30 kV[4]
Maximum Substrate Size—6 inch[4]
Stage—Motorized x/y/z axes[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]inventory listing
  4. [4]nnci.netnnci.net