Waferpedia

Comparison ledger

101versusMicralign

EV Group 101, Perkin Elmer Micralign, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
101EV Group
MicralignPerkin Elmer
OEMEV GroupPerkin Elmer
CategoryLithographyLithography
Wafer size—2-inch, 2.5-inch, or 3-inch wafers; optionally 4×4-inch, 3.5×3.5-inch, or 3×3-inch masks
Process node——
Introduced—1973
Production run—1971–1990
Lifecycle—Discontinued
Lifecycle milestones—1990 Divestiture
Control system——
Generation——
FamilyEV Group 101Perkin Elmer Micralign
Cited variants—
Specifications
OEMEV Group[2]Perkin-Elmer[1]
Model101[2]—
Equipment nameEVG 101 Spray Coater[2]—
NEMO IDevgspraycoat[2]—
Training requiredEVG 101 Training[2]—
Training duration1.50 hours[2]—
Processing techniqueResist Spray Coat (manual)[2]—
Cleanliness"All"[2]—
LocationSNF Paul G Allen L107 Cleanroom[2]—
Wafer diameter (substrate size)up to 300 mm[3]—
Available modulesSpin coat / OmniSpray® / develop[3]—
Wafer handling optionsBowed / warped / thin wafer handling, edge handling[3]—
Dispense optionsVarious resist dispense pumps covering viscosities up to 52000 cP; constant pressure dispense systems; EBR / BSR / pre-wet / bowl wash / liquid priming[3]—
Processing technique (at SNF)Resist Spray Coat (manual)[4]—
Cleanliness group (at SNF)"All"[2]—
Model family—Micralign[1]
Type—projection aligner[1]
Introduction year—1973[1]
First sold model—Micralign 100[1]
First sold—1973[1]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]en.wikipedia.orgen.wikipedia.org
  2. [2]snfguide.stanford.edusnfguide.stanford.edu
  3. [3]evgroup.comevgroup.com
  4. [4]snfguide.stanford.edusnfguide.stanford.edu