Comparison ledger
EV Group 101, Nikon NSR S 203 B, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 101EV Group | NSR S 203 BNikon |
|---|---|---|
| OEM | EV Group | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 101 | Nikon NSR S 203 |
| Specifications | ||
| OEM | EV Group[1] | — |
| Model | 101[1] | NSR S 203 B[4] |
| Equipment name | EVG 101 Spray Coater[1] | — |
| NEMO ID | evgspraycoat[1] | — |
| Training required | EVG 101 Training[1] | — |
| Training duration | 1.50 hours[1] | — |
| Processing technique | Resist Spray Coat (manual)[1] | — |
| Cleanliness | "All"[1] | — |
| Location | SNF Paul G Allen L107 Cleanroom[1] | — |
| Wafer diameter (substrate size) | up to 300 mm[2] | — |
| Available modules | Spin coat / OmniSpray® / develop[2] | — |
| Wafer handling options | Bowed / warped / thin wafer handling, edge handling[2] | — |
| Dispense options | Various resist dispense pumps covering viscosities up to 52000 cP; constant pressure dispense systems; EBR / BSR / pre-wet / bowl wash / liquid priming[2] | — |
| Processing technique (at SNF) | Resist Spray Coat (manual)[3] | — |
| Cleanliness group (at SNF) | "All"[1] | — |
| Software Version | — | MCSV[4] |
| CIM | — | SECS[4] |
| Handler System | — | WL Type 3[4] |
| Factory Interface | — | Open Cassette[4] |
| Excluded | — | Hard Drives (2)[4] |
| Process | — | Scanner[5] |
| Configuration | — | 248 nm[5] |
| Handler | — | WL Type 3[7] |
| IU Flare | — | 0.84%[7] |
| Lens Flare | — | 8.50%[7] |
| Uniformity | — | 6.00%[7] |
| Power | — | 541 mW/cm2[7] |
| Total Focus Deviation | — | 0.202 µm[7] |
| Astigmatism | — | 0.119 µm[7] |
| Coma | — | 0.040 µm[7] |
| ISO DOF | — | 0.275 µm[7] |
| Wafer size | — | 200 mm (8 inch)[4] |
| Wavelength | — | 248 nm[5] |
| Process type | — | Scanner[5] |
| CIM interface | — | SECS[4] |
| Iso DOF | — | 0.241 µm[8] |
| Light source | — | Cymer ELS 5410[6] |
| Manufacturer | — | Nikon[4] |
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