Comparison ledger
CHA SE600, Zeiss Ultra-55, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | SE600CHA | Ultra-55Zeiss |
|---|---|---|
| OEM | CHA | Zeiss |
| Category | Lithography | Lithography |
| Wafer size | 300mm | 300mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | CHA SE600 | Zeiss Ultra-55 |
| Specifications | ||
| Tool type | Electron Beam Lithography System[1] | — |
| Substrate range | 10 mm pieces up to 300 mm wafers[1] | — |
| Minimum feature size | less than 10 nm[1] | — |
| Equipment type | Electron beam evaporator[2] | — |
| Alternate description | Gold evaporator[3] | — |
| Manufacturer | CHA[2] | — |
| Part number | SE600[3] | — |
| Unit vintage date | 01.06.1980[2] | — |
| Installed accessory | — | Zyvex S-100 Nanoprobes installed on the Zeiss Ultra-55 SEM[1] |
| Operating condition | — | Operate under vacuum during imaging or with the beam blanked[1] |
| Probe count | — | Three individually controlled nanoprobes[1] |
| Placement precision | — | Five nanometers[1] |
| Minimum tip radius | — | Fifty nanometers[1] |
| Category | — | Lithography[4] |
| Wafer size | — | 300mm[4] |
| Instrument type | — | Field emission scanning electron microscope (FESEM)[5] |
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