Comparison ledger
Axcelis 200 ACU, SPTS uEtch, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 200 ACUAxcelis | uEtchSPTS |
|---|---|---|
| OEM | Axcelis | SPTS |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Axcelis NV GSD 200 | SPTS uEtch |
| Specifications | ||
| Configuration | Parts Machine[1] | — |
| Manufacturer | Axcelis[1] | — |
| Model | 200 ACU[1] | — |
| Tool type | Asher[1] | — |
| Wafer size | 200mm[3] | — |
| Serial number | AU6A356AH[3] | — |
| Computer system | M 200 PC, M 200[4] | — |
| Part number | SC 4572 A[4] | — |
| Volts | 208[4] | — |
| Amps | 30[4] | — |
| Equipment type | Asher[1] | — |
| Wafer configuration | 8 inch[2] | — |
| Process type | — | Vapor-phase, selective, isotropic etch on sacrificial oxide[5] |
| Process chemistry | — | Anhydrous HF and ethanol (C2H5OH) with nitrogen (N2) gas mixture[5] |
| Operating pressure | — | 125 Torr fixed for the standard processes[5] |
| Standard recipes | — | Recipe1, Recipe2, Recipe3, Recipe4, Recipe5[5] |
| Minimum etch rate - Recipe1 | — | 12 nm/min[5] |
| Minimum etch rate - Recipe2 | — | 38 nm/min[5] |
| Minimum etch rate - Recipe3 | — | 125 nm/min[5] |
| Minimum etch rate - Recipe4 | — | 153 nm/min[5] |
| Minimum etch rate - Recipe5 | — | 175 nm/min[5] |
| Chemistry | — | Anhydrous HF and ethanol (C2H5OH) vapor with N2 carrier[5] |
| Total pressure | — | 125 Torr (fixed for standard processes)[5] |
| Recipe 1 etch rate (thermal oxide) | — | 12 nm/min minimum[5] |
| Recipe 2 etch rate (thermal oxide) | — | 38 nm/min minimum[5] |
| Recipe 3 etch rate (thermal oxide) | — | 125 nm/min minimum[5] |
| Recipe 4 etch rate (thermal oxide) | — | 153 nm/min minimum[5] |
| Recipe 5 etch rate (thermal oxide) | — | 175 nm/min minimum[5] |
| Maximum wafer size for etch rate measurement | — | 4-inch substrate (blanket thermal SiO2)[5] |
| Chamber pressure range (manual needle valve) | — | 75–150 Torr[5] |
| Gases used | — | Anhydrous HF, ethanol (C2H5OH) vapor, nitrogen (N2)[5] |
| Total process pressure | — | 125 Torr[5] |
| Minimum etch rate (Recipe1, thermal oxide) | — | 12 nm/min[5] |
| Minimum etch rate (Recipe2, thermal oxide) | — | 38 nm/min[5] |
| Minimum etch rate (Recipe3, thermal oxide) | — | 125 nm/min[5] |
| Minimum etch rate (Recipe4, thermal oxide) | — | 153 nm/min[5] |
| Minimum etch rate (Recipe5, thermal oxide) | — | 175 nm/min[5] |
| Process pressure | — | 125 Torr (fixed for all standard processes)[5] |
| Process Recipe1 minimum etch rate (thermal oxide) | — | 12 nm/min[5] |
| Process Recipe2 minimum etch rate (thermal oxide) | — | 38 nm/min[5] |
| Process Recipe3 minimum etch rate (thermal oxide) | — | 125 nm/min[5] |
| Process Recipe4 minimum etch rate (thermal oxide) | — | 153 nm/min[5] |
| Process Recipe5 minimum etch rate (thermal oxide) | — | 175 nm/min[5] |
| Process gases | — | Anhydrous HF, ethanol vapor, N2[5] |
| Etch chemistry | — | Vapor-phase HF with ethanol catalyst, selective to SiO2 over Si and other materials[5] |
| Primary use | — | Sacrificial oxide release[5] |
| Target material | — | Sacrificial SiO2[5] |
| Recipe1 minimum etch rate | — | 12 nm/min[5] |
| Recipe2 minimum etch rate | — | 38 nm/min[5] |
| Recipe3 minimum etch rate | — | 125 nm/min[5] |
| Recipe4 minimum etch rate | — | 153 nm/min[5] |
| Recipe5 minimum etch rate | — | 175 nm/min[5] |
| Recommended minimum etch duration | — | 15 min[5] |
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