Waferpedia

Comparison ledger

A 412 LPCVDversus1088

ASM A 412 LPCVD, Heller 1088, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
1088Heller
OEMASMHeller
CategoryThermal / DiffusionThermal / Diffusion
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyASM A 412 LPCVDHeller 1088
Cited variants—
Specifications
ConfigurationNITR[1]—
OEMASM[1]—
ModelA 412[1]—
Tool typeLPCVD furnace (Low Pressure Chemical Vapor Deposition)[1]—
Wafer size12 inch[1]—
Vintage2006[1]—
Equipment typeLPCVD Furnace (Low Pressure Chemical Vapor Deposition)[1]—
Heating Zones—8 zones (4 top and 4 below) plus 1 cooling zone[4]
Heating Method—Forced convection[4]
Conveyor Width—18 inches (45 cm)[4]
Heated Length—43.5 inches (111 cm)[4]
Overall Length—96 inches (244 cm)[4]
Height—50 inches (127 cm)[4]
Net Weight—900 lbs (409 kg)[4]
Thermal Profiler—Included[4]
Oven Top—Counter balance for easy access to conveyor[4]
Solder Compatibility—Lead-free and leaded soldering[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]inventory listing
  3. [3]inventory listing
  4. [4]smtdevices.comsmtdevices.com