Waferpedia

Comparison ledger

Centura MXPversus1512e

Applied Materials Centura MXP, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
Centura MXPApplied Materials
1512eTegal
OEMApplied MaterialsTegal
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials Centura MXPTegal 1512e
Specifications
Configuration3 CH[1]—
Phase3 Phase[1]—
Frequency50 Hz[1]—
Voltage208 VAC[1]—
WiresFour[2]—
Full Load Current240 A[2]—
H/E 10242-02163 REV D[3]—
UPSDPWR 35611[3]—
H/E (CH-B_C_D_Wall)0242-02163 REV D[3]—
Chambers3 CH[1]—
RobotHP Robot[1]—
Power Supply Voltage208 VAC[1]—
Power Supply Frequency50 Hz[1]—
Number of WiresFour / 4 Wires[1]—
Tool type—Industrial RIE plasma etcher system[4]
Stated configuration—With modules assembly for CI-4222[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]inventory listing
  4. [4]semistarcorp.comsemistarcorp.com