Waferpedia

Comparison ledger

0041-39086 ESC PartversusXeF2

Applied Materials 0041-39086 ESC Part, SPTS XeF2, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0041-39086 ESC PartApplied Materials
XeF2SPTS
OEMApplied MaterialsSPTS
CategoryEtchEtch
Wafer size—Up to 6-inch wafers
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones—2013 Acquisition of XACTIX, Inc. · 2013 XACTIX acquisition
Control system——
Generation——
Family—SPTS XeF2
Specifications
Etch type—Isotropic etch[1]
Selectivity—Over 1000:1 between Si/photoresist, Si/SiO2, and Si/SiN[1]
Gas flow modes—Continuous and pulsed gas flow[1]
Operating temperature—Room temperature[1]
Plasma—No plasma[1]
Substrate size—Up to 6-inch wafers[1]
Isotropic etch materials—Si, Mo, Ge, W, C[1]

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Sources (1)Every fact above is drawn from these public sources
  1. [1]aggiefab.tamu.eduaggiefab.tamu.edu