Waferpedia

Comparison ledger

0020 18455 PartversusOpAL

Applied Materials 0020 18455 Part, Oxford Instruments OpAL, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 18455 PartApplied Materials
OpALOxford Instruments
OEMApplied MaterialsOxford Instruments
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 18455 PartOxford Instruments OpAL
Specifications
ConfigurationShaft,Rf In Local Match, Hdpcvd,Rev3[1]Single open loop chamber (non-loadlocked)[2]
Heated table—80-300ºC[2]
Voltage—208V, 3Ph, 60Hz, 25A[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing