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Comparison ledger

0010 47763versusCentura AP Enabler Dielectric

Applied Materials 0010 47763, Applied Materials Centura AP Enabler Dielectric, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010 47763Applied Materials
OEMApplied MaterialsApplied Materials
CategoryEtchEtch
Wafer size—Diameter 300+/- 0.05mm(SEMI M28), 775 +/- 25um, Notch
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010 47763Applied Materials Centura
Cited variants—
  • Centura AP Enabler E5[1]
Specifications
Configuration2nd Source New[2]HDD not included[5]
TypeMonopolar Dual Heated[3]—
DescriptionASSY, ESC, BONDED, MONOPOLAR DUAL HEATED[4]Dielectric Etch[6]
Possible MaterialsAl2O3 (aluminum oxide) or AlN (aluminum nitride)[3]—
Model0010-47763[2]—
OEMApplied Materials[2]—
Material (possible)Al2O3 (aluminum oxide) or AlN (aluminum nitride)[3]—
ApplicationFixing wafers in etching process (PVD, CVD, ETCH)[3]—
Quantity available (source)1[3]—
Wafer Size—Diameter 300+/- 0.05mm(SEMI M28), 775 +/- 25um, Notch[5]
Online Connection—GEM / CIM JGJ (Hardware Interface : Ethernet 100Base-Tx)[5]
Inter Face—3 carrier stage (Continuous flow operation) w/ 3 Loadports (Semi compliant[5]
Interface A—Hardware related to EDA[5]
Corrosion Resistant FI & SWLL—N/A[5]
Loader Mod Corrosion Prevent—N/A[5]
Standard SWLL—Standard SWLL[5]
Side Storage Pod—Side Storage Pod (Left/Right)[5]
OCR—KIT, YAT BACKSIDE OCR, 300MM 5.3FI[5]
Facility Plate—N2 Regulator : Supplied by customer in floor, CDA regulator 125 PSI onboard[5]
Transfer Pressure Monitor—10 Torr Manometer and 1SLM N2 APC, kit[5]
Load Lock Pressure Monitor—GAUGE VAC MINI-CONVECTRON W/1-SETPOINT CAJON FTG analog[5]
Transfer Chamber Blade Kit—Transfer Chamber Accelerator Blade Kit[5]
LL ISO-Slit Valve Grp Elast.—AP Chemraz 513 Elastomer[5]
Interface—3 carrier stage (Continuous flow operation) w/ 3 Loadports (Semi compliant[5]
Atmospheric Robot—KAWASAKI A3[5]
Mainframe Robot—VXP with Dual blade[5]
Loadport Type—Enhanced 25 wafer FOUP[5]
Loadports—Loadport System[5]
EMO Type—Turn to Release (Front x3, Rear x4) - 3 on FI, 1 on front of FI and one on each side of FI. Rear: 1 for each process chamber.[5]
System Monitors—Monitor #1 is Flat Panel with Keyboard on stand / Monitor #2 is through the wall flat panel (optional)[5]
Voltage—208V, 50/60Hz[5]
Vintage—2010[5]
Version—300mm[7]
Process Chambers—4 process chambers[1]
Fab Interface Type—Centura Etch 5.3 FAC. Frame 5.3 Fi Rev 002[1]
RF Gen Top (162MHz Source)—3500W RF POWER SUPPLY, 162 MHZ, FIXED FREQUENCY, 208VAC, WATER COOLED (0190-29389)[1]
RF Gen #1 Bottom (13MHz Bias)—RF GENERATOR, 13MHZ 5KW, 300MM, RACK MOUNT (0190-15319)[1]
RF Gen #2 Bottom (2MHz Bias)—RF GEN PLASMA 9KW 2MHZ ENI (0190-29586)[1]
Endpoint Type—Endpoint type (Eye-D) (0246-00196)[1]
TMP—Shimadzu D3403M, 3000 litre TMP[1]
Dry Pump—N(ESR80WN (EBARA); customer Supply)[1]
Chamber Controller Module—SBC C400MHZ, 3U CPCI, 256MB RAM[1]
Gas Line 1—C4F6 100 sccm UNIT IFC-125[1]
Gas Line 2—CH2F2 100 sccm UNIT IFC-125[1]
Gas Line 3—C3F8 50 sccm UNIT IFC-125[1]
Gas Line 4—O2_M 300 sccm UNIT-125[1]
Gas Line 5—SO2 200 sccm UNIT IFC-125[1]
Gas Line 6—CF4 200 sccm UNIT IFC-125[1]
Gas Line 7—C4F6_IGI 5 sccm UNIT-125[1]
Gas Line 8—O2_IGI 5 sccm UNIT-125[1]
Gas Line 9—O2_L 50 sccm UNIT-125[1]
Gas Line 10—O2_H 5000 sccm UNIT-125[1]
Gas Line 11—Ar 2000 sccm UNIT-125[1]
Gas Line 12—N2 200 sccm UNIT-125[1]
Gas Line 13—CHF3 200 sccm UNIT-125[1]
Gas Line 14—C4F8 100 sccm UNIT-125[1]
Source Bottom Ring—QUARTZ RING SOURCE, E5 (0200-07362)[1]
Showerhead Assy—Showerhead Assy, 4mm SiC Top Electrode Tokai (0041-32335)[1]
Wafer Pass Through—Not available[5]

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Sources (7)Every fact above is drawn from these public sources
  1. [1]fabsurplus.comfabsurplus.com
  2. [2]inventory listing
  3. [3]saulcontrol.comsaulcontrol.com
  4. [4]getspares.comgetspares.com
  5. [5]inventory listing
  6. [6]fabsurplus.comfabsurplus.com
  7. [7]fabsurplus.comfabsurplus.com