Waferpedia

Comparison ledger

0010-21246 PartversusVision 2000-C™

Applied Materials 0010-21246 Part, MKS Vision 2000-C™, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-21246 PartApplied Materials
OEMApplied MaterialsMKS
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—MKS Vision 2000-C™
Cited variants—
  • Vision 2000-E™[1]
Specifications
Minimum Detectable Partial Pressure—<2.7e-9 Pa (<2e-11 Torr)[1]
Monitoring Type—Continuous in situ monitoring[1]
Baseline Monitoring—Air leaks and background contamination[1]
Remote Vacuum Controller—RVC for failsafe vacuum operation[1]
Sources (1)Every fact above is drawn from these public sources
  1. [1]api.p1.mks.comapi.p1.mks.com