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0010-13622 RF Match forversusGasonics Vector Express

Applied Materials 0010-13622 RF Match for, Lam Research Gasonics Vector Express, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
0010-13622 RF Match forApplied Materials
Gasonics Vector ExpressLam Research
OEMApplied MaterialsLam Research
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-13622 RF Match forLam Research Gasonics Vector
Specifications
ConfigurationHigh Efficiency HE RF Match-Bias[1]TEOS[2]
Model0010-13622[1]Vector Express[2]
Product TypeRF Match for PVD (Physical Vapor Deposition)[1]—
FeatureHigh Efficiency HE RF Match-Bias[1]—
OEM—Lam / Novellus / Gasonics[2]
System type—PECVD (Plasma-Enhanced Chemical Vapor Deposition)[2]
Wafer size—12 inch[2]
Process—TEOS[2]
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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]inventory listing