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Comparison ledger

0010-03485 Magnet AssyversusAct 12

Applied Materials 0010-03485 Magnet Assy, Tokyo Electron Act 12, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
Act 12Tokyo Electron
OEMApplied MaterialsTokyo Electron
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyTokyo Electron Act 12
Specifications
ConfigurationWP AL 300mm PVD[1]2Coater 2B.L.Cot 4Developer[5]
OEMApplied Materials[1]—
Model0010-03485[1]—
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]—
ProcessPVD[3]—
Wafer size300mm[4]—
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]—
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Wafer Size—8 inch[9]
Vintage—2003
Coaters & Developers Vintage—2002
Number of Coater Modules—2[5]
Number of Bottom-Layer Coat Modules—2[5]
Number of Developer Modules—4[5]
Sources (9)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]inventory listing
  6. [6]inventory listing
  7. [7]inventory listing
  8. [8]inventory listing
  9. [9]Equipment inventory listing