Waferpedia

Comparison ledger

0010-03485 Magnet AssyversusTA 5000 Temperature Forcing

Applied Materials 0010-03485 Magnet Assy, MPI TA 5000 Temperature Forcing, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
OEMApplied MaterialsMPI
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyMPI TA 5000 Temperature Forcing
Cited variants—
Specifications
ConfigurationWP AL 300mm PVD[2]—
OEMApplied Materials[2]—
Model0010-03485[2]—
DescriptionMAGNET ASSY, WP AL 300MM PVD[3]—
ProcessPVD[4]—
Wafer size300mm[5]—
VersionSpares[5]—
Part Number0010-03485[2]—
ManufacturerApplied Materials[2]—
Process TypePVD (Physical Vapor Deposition)[2]—
Application (Material)Aluminum (AL)[2]—
Wafer Diameter (associated)300 mm[2]—
Temperature Range—–80 °C to +225 °C[6]
Airflow Rate—4–25 SCFM[6]
Temperature Ramp Rate—<10 s for –55 °C to +125 °C transition[6]
Control Modes—AIR MODE (integrated nozzle thermocouple), External T-type/K-type thermocouple, RTD, Diode input[6]
Interface Ports—4× USB-A, 1× USB-B, VGA, LAN, RS-232, T/K/RTD sensor inputs, SOT/EOT automation interface[6]
Power Supply—200–250 VAC, 50/60 Hz[6]
Noise Level—Ultra-low (variable-frequency compressor)[6]
Compliance—Designed for GLP/GMP-aligned lab environments[6]
Sources (6)Every fact above is drawn from these public sources
  1. [1]mpithermal.commpithermal.com
  2. [2]inventory listing
  3. [3]semistarcorp.comsemistarcorp.com
  4. [4]layla-ec.comlayla-ec.com
  5. [5]fabsurplus.comfabsurplus.com
  6. [6]instrumenthive.cominstrumenthive.com