Comparison ledger
Agilent 6890 GC, Applied Materials 0010-03485 Magnet Assy, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 6890 GCAgilent | 0010-03485 Magnet AssyApplied Materials |
|---|---|---|
| OEM | Agilent | Applied Materials |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | 2015 OEM support ended | — |
| Control system | — | — |
| Generation | — | — |
| Family | Agilent 6890 | Applied Materials 0010-03485 Magnet Assy |
| Specifications | ||
| Configuration | With[1] | WP AL 300mm PVD[5] |
| Manufacturer | Agilent[1] | Applied Materials[5] |
| Model | 6890 GC[1] | 0010-03485[5] |
| Equipment type | Gas Chromatography[1] | — |
| Electronic pneumatic control | Controls all gas pressures and flows[2] | — |
| Inlet type | Split/Splitless inlet[2] | — |
| Inlet count | Up to two inlets[2] | — |
| Detector count | Up to three detectors[2] | — |
| Oven range | 4 to 450°C[2] | — |
| Oven programming | 20 ramps, 21 plateaus[2] | — |
| Fast ramp rate | To 75°C/min on a 120 V oven[2] | — |
| EPC resolution | 0.001 psi, 0.05 mL/min[2] | — |
| Communications | HPIB communications[2] | — |
| Included detector | Flame Ionization Detector (FID)[2] | — |
| Included detector configuration | Dual FID[3] | — |
| Included components | HP 5973 MSD, Agilent 7683 Injector, Agilent 7683 Autosampler[1] | — |
| Training material | Agilent 6890 GC and ChemStation Operation[4] | — |
| OEM | — | Applied Materials[5] |
| Description | — | MAGNET ASSY, WP AL 300MM PVD[6] |
| Process | — | PVD[7] |
| Wafer size | — | 300mm[8] |
| Version | — | Spares[8] |
| Part Number | — | 0010-03485[5] |
| Process Type | — | PVD (Physical Vapor Deposition)[5] |
| Application (Material) | — | Aluminum (AL)[5] |
| Wafer Diameter (associated) | — | 300 mm[5] |