Waferpedia

Comparison ledger

900eversus981ACS

Tegal 900e, Tegal 981ACS, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
900eTegal
981ACSTegal
OEMTegalTegal
CategoryEtchEtch
Wafer size150mm150mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyTegal 900eTegal 981ACS
Cited variants—
Specifications
Tool typesingle wafer cassette-to-cassette etch system[1]—
Processnon-critical plasma etch processes[1]—
Wafer size3 in to 150 mm wafers[1]—
Control systemAdvanced Control System (ACS) field upgrades available for customers already invested in the Tegal 900e Series[1]—
Wafer size (diameter)—150 mm, 200 mm[2]
Wafer size (square)—100 mm square, 6-inch square[2]
Reactor type—Wide-gap diode (scaled-up version of 901ACS)[2]
Applications—Non-critical photoresist removal, photoresist trimming, large-scale etching, planarization, backside etching, BioChip nanotechnology[2]
Footprint—Small; no external rack-mount electronics[2]
User interface—Intuitive touchscreen interface[2]
Maintenance—Long-lasting, low maintenance parts[2]
Wafer handling—Cassette to cassette (no manual handling)[2]
Temperature control—All electrodes precisely temperature controlled[2]

Plan your fab

Building a Etch process? Get a complete equipment list.

Open the fab equipment planner →
Sources (2)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]plasmatherm.complasmatherm.com