Waferpedia

Comparison ledger

350W MJB3 Maskversus1000 Family

SUSS MicroTec 350W MJB3 Mask, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
350W MJB3 MaskSUSS MicroTec
1000 FamilyUltratech
OEMSUSS MicroTecUltratech
CategoryLithographyLithography
Wafer sizeWafer Equipment—
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySUSS MicroTec 350W MJB3 MaskUltratech 1000 Family
Specifications
Wafer sizeWafer Equipment[1]—
- ModelMJB3 Main System[1]—
- ManufacturerSuss MicroTec / Karl Suss[1]—
- Max Wafer Size3" Diameter[1]—
- Eyepieces10x[1]—
- Objectives3.5x and 10x[1]—
- Exposure ModeVacuum Contact, Hard & Soft[1]—
- Exposure Resolution0.8 Microns (under optimum conditions)[1]—
- Alignment Resolution0.25um (operator dependant)[1]—
Alignment modeTop Side Alignment[1]—
Power supplyCIC 500[1]—
Lamphouse350 watt[1]—
Exposure opticsUV400 exposure optics for 365nm and 405nm exposure[1]—
MicroscopeSuss M230 Splitfield Microscope[1]—
Maskholder1 included for 4"x4" masks[1]—
Wafer chuck1 included[1]—
BulbBrand new 350W bulb, qty. 1 included[1]—
ManualOperations Manual for Suss MJB3 Mask Aligner[1]—
Configured forTop Side Alignment[1]—
Tool type—Photolithography step-and-repeat 1X stepper[2]
Optical design—Wynne Dyson[2]
Magnification—1X[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]dealer listingwotol.com
  2. [2]en.wikipedia.orgen.wikipedia.org