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150 e Maskversus1500

SUSS MicroTec 150 e Mask, Ultratech 1500, side by side. Every value shown is drawn from the cited encyclopedia entries.

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Side-by-side comparison of selected equipment models
Attribute
150 e MaskSUSS MicroTec
1500Ultratech
OEMSUSS MicroTecUltratech
CategoryLithographyLithography
Wafer size—Wafer loader
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySUSS MicroTec 150 e MaskUltratech 1500
Specifications
Configuration—50/60 Hz[1]
Wafer size—Wafer loader[1]
Power—50/60 Hz, 12 Amp[1]
Wafer loader—Yes[1]
Numerical aperture—0.32 NA[2]
Exposure source—Broadband, gh-line[2]
Vintage—2000[1]
Illumination—Broadband[2]
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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]cores.research.asu.educores.research.asu.edu
  3. [3]smif.pratt.duke.edusmif.pratt.duke.edu