SPTS
MVD300 alternatives
Comparable Deposition equipment documented in the Waferpedia catalog.
6 comparable tools
Denton Vacuum
635LL
200mm
Deposition
The Denton 635LL is a four-cathode sputter deposition system that coats substrates up to 200 mm in diameter.
ASM
E 2000 Epitaxial Reactor
200mm
Deposition
The ASM E 2000 is a radiantly heated, single-wafer epitaxial reactor for chemical vapor deposition of doped or undoped silicon layers on wafers up to 200 mm (8 inches).
SPTS
MVD100E
200mm
Deposition
The SPTS MVD100E is a Molecular Vapor Deposition system designated for R&D or pilot manufacturing.
Applied Materials
0010-13622 RF Match for
Deposition
The Applied Materials 0010-13622 is an RF match unit intended for PVD (Physical Vapor Deposition) described as a High Efficiency HE RF Match-Bias.
Applied Materials
0020 12458 Part
Deposition
The Applied Materials 0020 12458 Part is an insulator, side match component for the Hdp-Cvd Ultima Plus system.
Applied Materials
0020 17485 Part
Deposition
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