Waferpedia

Comparison ledger

Raider ECD 312 Electroplatingversus-Mist 850 Electronic Air Filter

Semitool Raider ECD 312 Electroplating, Tri -Mist 850 Electronic Air Filter, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMSemitoolTri
CategoryLab & Support EquipmentLab & Support Equipment
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySemitool Raider ECDTri -Mist 850 Electronic Air Filter
Specifications
Phase3 Phase[1]—
Configuration50/60 Hz[1]—
Voltage380 V[1]—
Loadport3 X FOUP[1]—
PCFUI[1]—
Power Phase3 Phase[1]—
Frequency50/60 Hz[1]—
Wafer Handling RobotXfer Robot, 1x Linear Dual Arm with Edge Grip Endeffector[1]—
Vacuum and RinseVacuum prewet, 1 Stack SRD[1]—
Chemical Tanks11[1]—
Chillers4[1]—
ControllerPC with FUI[1]—
Chamber ComponentsChamber lift assy, Spin motor, Push plate control board, Plate sylinder (2), Contact Ring (only ECD), Lip seal (only eCD), Flow pump (only eCD), Anode basket (only eCD)[1]—
Tank ComponentsTank body, Circulation pump, Filter housing, Heater housing, Level sensor (5), Tank remote board, Tank control block[1]—
Vintage2011[1]—

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Sources (1)Every fact above is drawn from these public sources
  1. [1]inventory listing