Waferpedia

Comparison ledger

421 Scepter Spray Solventversus1000P

Semitool 421 Scepter Spray Solvent, YES 1000P, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMSemitoolYES
CategoryWet Processing / CleanWet Processing / Clean
Wafer sizeBatch Solvent Processor for Wafer Cleaning—
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones—1998 Acquisition
Control system——
Generation——
FamilySemitool 421YES 1000P
Cited variants—
Specifications
Wafer sizeBatch Solvent Processor for Wafer Cleaning[2]—
ConfigurationMax Substrate Size of 8”/200mm[2]Parallel plate[6]
Maximum substrate size200 mm (8 inch)[2]—
Batch capacityUp to 50 wafers[3]—
Chamber typeSingle chamber[3]—
Automation levelSemi-automated[3]—
Number of tanks4 stainless steel (2 heated, 2 ambient)[4]—
Process applicationsPolymer removal, resist stripping, wafer cleaning, metal lift-off[4]—
OEM model numberSST-421[4]—
Also known asScepter Spray Solvent Tool (SST)[2]—
Maximum wafer count per batch50 wafers[2]—
Number of heated tanks2[4]—
Rotor included1 rotor (select size at time of order)[4]—
Touch screenClass 1 Touch Screen Monitor[1]—
PumpsPneumatic pumps, Trebor 610 back[1]—
Model—1000P[5]
System type—Plasma cleaning system[5]
Shelf configuration—Four 16 x 16 inch shelves[5]
Total capacity—1024 square inches[5]
Control system—PLC driven with plain English real time process readout and diagnostics in the event of system abort[5]
Number of shelves—4[5]
Shelf size—16 x 16 inches[5]
Power—1000 W[6]
Operation modes—Active, RIE, Downstream[5]
Sample size range—From smallest semiconductor chip to large flat panels[5]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]hfsemi.comhfsemi.com
  2. [2]inventory listing
  3. [3]classoneequipment.comclassoneequipment.com
  4. [4]classoneequipment.comclassoneequipment.com
  5. [5]web.archive.orgweb.archive.org
  6. [6]semistarcorp.comsemistarcorp.com