Waferpedia

Comparison ledger

11600 SRDversusClean Track Mark 7

Semitool 11600 SRD, Tokyo Electron Clean Track Mark 7, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
11600 SRDSemitool
Clean Track Mark 7Tokyo Electron
OEMSemitoolTokyo Electron
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySemitool 11600 SRDTokyo Electron Clean Track
Cited variants—
Specifications
ConfigurationCeramic[2]not working[3]
ManufacturerSemitool[2]—
Model11600 SRD[2]—
Equipment typeSpin Rinse Dryer[2]—
Wafer size (specific listing)—8 inch[4]
Wafer size (platform capability)—5 inch to 8 inch[1]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]inventory listing
  3. [3]inventory listing
  4. [4]Equipment inventory listing