Waferpedia

Comparison ledger

11600 SRDversusM 3303 Lift Off

Semitool 11600 SRD, SSEC M 3303 Lift Off, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
11600 SRDSemitool
OEMSemitoolSSEC
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilySemitool 11600 SRDSSEC M 3303 Lift Off
Specifications
ConfigurationCeramic[1]Single phase[2]
ManufacturerSemitool[1]—
Model11600 SRD[1]—
Equipment typeSpin Rinse Dryer[1]—
Voltage—208 VAC[2]
Frequency—60 Hz[2]
Wafer Size—8 inch[2]
Phase—Single phase[2]
Current—20 A[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing