Comparison ledger
Plasma-Therm SLR 770 ICP Deep Silicon, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | SLR 770 ICP Deep SiliconPlasma-Therm | 1512eTegal |
|---|---|---|
| OEM | Plasma-Therm | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Plasma-Therm SLR 770 | Tegal 1512e |
| Specifications | ||
| Configuration | Load lock shuttle lock transfer[1] | — |
| Process Gas | O2, Ar, SF6, C4F6[1] | — |
| Chiller | Neslab HX300[1] | — |
| Power Box | Square D[1] | — |
| Manufacturer | Plasma-Therm[1] | — |
| Model | SLR 770[1] | — |
| Category | Etch[1] | — |
| Wafer sizes | 4 inch[1] | — |
| Tool type | Single-chamber inductively coupled plasma etcher[2] | Industrial RIE plasma etcher system[4] |
| Wafer handling | Load lock shuttle lock transfer[1] | — |
| Load lock | Single wafer semi-auto load lock[3] | — |
| Application | Deep silicon etch[3] | — |
| Gas box | Horiba SEC-E40 (4)[1] | — |
| Process gases | O2, Ar, SF6, C4F6[1] | — |
| Controller and RF generator | RF Power Products RFPP I22050001 & I20050007[1] | — |
| Adaptive pressure controller | VAT PM-5[1] | — |
| Heater controller | Plasmatherm PC OS[1] | — |
| RF generator | RF Power Products RFPP RF5S & AM-5[1] | — |
| Turbo pump and controller | Leybold MAG 2000; Leybold MD 2000[1] | — |
| Vintage | 01.06.1998[3] | — |
| Power | 1.0 kW ICP RF package; 2 kW generator limited to 1.0 kW; 500 W RF bias[3] | — |
| Gas box lines | 5 lines[3] | — |
| Additional process gases | CHF3, C4F8, SF6, Ar, O2[3] | — |
| Dry pump | Edwards ih80[3] | — |
| Load lock dry pump | Edwards nxds[3] | — |
| Load lock turbo pump | Leybold[3] | — |
| Turbo pump | Edwards STPA-1303CV[3] | — |
| Electrical | 380VAC 3 phase[3] | — |
| Stated configuration | — | With modules assembly for CI-4222[4] |
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