Waferpedia

Comparison ledger

100 ICP FluorineversusTegal 903

Oxford Instruments 100 ICP Fluorine, Tegal Tegal 903, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
100 ICP FluorineOxford Instruments
OEMOxford InstrumentsTegal
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyOxford Instruments 100 ICP FluorineTegal Tegal 903
Cited variants—
  • Tegal 903e Table Top, Upgraded[1]
  • Tegal 903e Direct Cooled TTW, Standard[1]
Specifications
Etch GasesSF6, CF4, O2, Ar, N2, CHF3, C4F8[2]—
Cryo DRIE etch rateup to 5 µm/min[2]—
Wafer size4 inch, 6 inch, 8 inch (with clamp change)[2]—
Product series—Tegal 9XX Series Etchers[1]
Variant—Tegal 903e Table Top, Upgraded[1]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]legacysemi.comlegacysemi.com
  2. [2]nanofab.utah.edunanofab.utah.edu