Comparison ledger
Nikon NSR 2005 i 10 C i-Line, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 150 e MaskSUSS MicroTec | |
|---|---|---|
| OEM | Nikon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | No wafer handler | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon NSR 2005 | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Handler Type | SiC Handling[1] | — |
| Configuration | Cassette Stage[1] | — |
| Handler Options | SiC Substrate[1] | — |
| OS Version | Nikon Nest[1] | — |
| CDA | N2[1] | — |
| DIW | Chilled Water[1] | — |
| Power | 208, 3 Phase[1] | — |
| Wafer size | No wafer handler[1] | — |
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