Waferpedia

Comparison ledger

Rainbow 4420 Multi-Processversus100 ICP Fluorine

Lam Research Rainbow 4420 Multi-Process, Oxford Instruments 100 ICP Fluorine, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
100 ICP FluorineOxford Instruments
OEMLam ResearchOxford Instruments
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyLam Research Rainbow 4420 Multi-ProcessOxford Instruments 100 ICP Fluorine
Specifications
OEMLam[1]—
ModelRainbow 4420[1]—
CategoryEtch[1]—
Wafer Sizes8 inch[1]—
Asset #153151[1]—
Last Confirm DateApril 15, 2026[1]—
Etch Gases—SF6, CF4, O2, Ar, N2, CHF3, C4F8[2]
Cryo DRIE etch rate—up to 5 µm/min[2]
Wafer size—4 inch, 6 inch, 8 inch (with clamp change)[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]nanofab.utah.edunanofab.utah.edu