Waferpedia

Comparison ledger

Gasonics L 3500versus11600 SRD

Lam Research Gasonics L 3500, Semitool 11600 SRD, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
Gasonics L 3500Lam Research
11600 SRDSemitool
OEMLam ResearchSemitool
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyLam Research Gasonics L 3500Semitool 11600 SRD
Specifications
Process typePlasma Asher[1]—
Wafer size12 inch[2]—
Process gasesO2 and N2[1]—
Robot upgradeHINE Hatm 5.0 atmospheric robot arm[3]—
Weight200 kg[3]—
Configuration—Ceramic[4]
Manufacturer—Semitool[4]
Model—11600 SRD[4]
Equipment type—Spin Rinse Dryer[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]semistarcorp.comsemistarcorp.com
  2. [2]Equipment inventory listing
  3. [3]online-auctions.beonline-auctions.be
  4. [4]inventory listing