Waferpedia

Comparison ledger

TP 500 Implant Dose Measurementversus160 XP Ion

KLA TP 500 Implant Dose Measurement, Varian 160 XP Ion, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMKLAVarian
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyKLA TP 500 Implant Dose MeasurementVarian 160 XP Ion
Specifications
ConfigurationSingle Phase[1]150mm High Current IMP[5]
Voltage120 V[1]—
Circuit Breaker20[1]—
Full Current Load7.5[1]—
Power ConfigurationSingle Phase[1]—
Frequency50/60 Hz[1]—
Circuit Breaker Rating20[1]—
Optics ConfigurationCamera Only[2]—
Wafer Size200 mm[4]—
OEM—Varian[6]
Model—160 XP Ion[6]
Category—Ion Implantation[5]
Tool type—ion implanter[5]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]inventory listing
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]waferpedia.comwaferpedia.com
  6. [6]Equipment inventory listing