Comparison ledger
Hitachi S 9300, KLA .496 PSL Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | S 9300Hitachi | |
|---|---|---|
| OEM | Hitachi | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Hitachi S 9300 | KLA .496 PSL Wafer |
| Specifications | ||
| Model | S-9300[1] | — |
| Type | Scanning Electron Microscope (SEM)[1] | — |
| Year of manufacture | 09-1999[2] | — |
| Wafer Size | 200mm & 300mm[2] | — |
| Serial number | 0301-03[2] | — |
| Power requirement | 6kVA Single Phase[2] | — |
| Components | Main unit, Supply unit, Control unit[2] | — |
| Vintage | 1996[1] | — |
| Wafer Size (CD SEM specification) | 200mm[3] | — |
| Wafer Imaging | X coverage from 5 – 295mm, Y coverage from 5 – 195mm[3] | — |
| Electron Gun | Schottky emission source[3] | — |
| Accelerating voltage | 500V to 1600V, 10V steps[3] | — |
| Field of view | 1.2mm[3] | — |
| Probe Current | 4~24pA with automated setting and measurement by Faraday cup[3] | — |
| Electromagnetic Lens | 3-Stage Electromagnetic Lens with boosting voltage[3] | — |
| Objective Lens | 4 opening click stop, heated aperture is selectable/adjustable outside the vacuum[3] | — |
| Scan Coil | 2-Stage Electromagnetic Deflection[3] | — |
| Astigmatism correction | via 8-pole electromagnetic coil[3] | — |
| Magnification | 1000x to >300000x[3] | — |
| Field control method | Continuously on for sample decharging at all voltages[3] | — |
| Wafer imaging ability | Entire surface of 8” or 12” wafer[3] | — |
| Depth of focus | ≥ 1.0um at 80000x magnification[3] | — |
| Resolution | 3nm (800V) Retarding/Boosting Mode[3] | — |
| Chemicals Used | Nitrogen, Oil free Air (OFA), PCW Glycol[3] | — |
| Workstation Model | HP B180L (9GB)[3] | — |
| Operating System | Unix version HP-UX 10.20 or newer[3] | — |
| Software Version | 14.71 or newer[3] | — |
| SECS/GEM Communication Interface | Yes[3] | — |
| Dual XY Hitachi Microscale | Yes[3] | — |
| DSP Image Processing | Yes[3] | — |
| BSE Mode | Yes[3] | — |
| Multipoint Measurement Function | Yes[3] | — |
| Edge Roughness Function | Yes[3] | — |
| Automated Image Archiving Function | Yes[3] | — |
| Wafer Handling System | 200mm Wafer Handling System, (2) Cassette holders with ergo flippers, Convertible to 300mm with conversion kit[3] | — |
| Optical Microscope System | Monochrome Image using CCD camera, 110x Magnification[3] | — |
| Equipment type | Scanning Electron Microscope[1] | — |
| System type | CD-SEM system[4] | — |
| Wafer size | 200mm and 300mm[2] | 8 inch[5] |
| Workstation | HP B180L (9GB)[3] | — |
| Control system OS | Unix version HP-UX 10.20 or newer[3] | — |
| Depth of Focus | ≥1.0µm at 80000x magnification[3] | — |
| Wafer Handling | 200mm cassette holders with ergo flippers; convertible to 300mm with conversion kit[3] | — |
| Configuration | — | NIST Traceable[5] |
| Traceability | — | NIST Traceable[5] |
| Compatible systems | — | Capable on Surfscan 6xy0 and SP1[5] |
| Category | — | Metrology & Inspection[6] |
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