Comparison ledger
Hitachi 1305 BSG 3, YES R1, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1305 BSG 3Hitachi | R1YES |
|---|---|---|
| OEM | Hitachi | YES |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | Legacy |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Hitachi 1305 BSG 3 | YES R1 |
| Cited variants | — |
|
| Specifications | ||
| Plasma clean benchmark | — | 5 minute Argon plasma clean[1] |
| Referenced use | — | Industry standard for 15 years[1] |
| Input power / rating | — | 120 V, 60 Hz, 1.4 A, 175 W[2] |
| Controller | — | Y.E.S. ‘Lark’ Logical Sequencer[2] |
| Plasma power source | — | Plasma-Therm PE-1000, ~1 kW, ~50 kHz, 115 VAC[2] |
| Matching network | — | Advanced Energy LM-5K manual transformer[2] |
| Vacuum pump | — | Fisher Scientific Maxima C Plus Model M2C, KF-16 inlet[2] |
| Process gases | — | Ar or O2[3] |
| Chamber temperature range | — | 25–80 °C (typical, from plasma heat)[3] |
| Maximum substrate size | — | 12 inch[3] |
| Sample size range | — | Small pieces up to 12 in x 12 in x 4 in[3] |
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