Comparison ledger
Hitachi 1305 BSG 3, Tokyo Electron Clean Track Lithius Pro Z i Resist, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1305 BSG 3Hitachi | Clean Track Lithius Pro Z i ResistTokyo Electron |
|---|---|---|
| OEM | Hitachi | Tokyo Electron |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Hitachi 1305 BSG 3 | Tokyo Electron Clean Track |
| Specifications | ||
| Configuration | — | Multi Block[1] |
| T&H Controller | — | Customer Provided[1] |
| Chemical Filter | — | Customer Provided[1] |
| Ingenio GL License | — | OEM Support/Buyer[1] |
| DEV | — | PTD:[1] |
| DEV Nozzle | — | MGP[1] |
| Rinse Nozzle | — | ADR Nozzles[1] |
| NTD Nozzle | — | IDN Nozzle[1] |
| Wafer Size | — | 12 inch[1] |
| Tool Type | — | Coater / Developer[1] |
| COT (Coating) Pump | — | With MACRD Pump, Direct Drain[1] |
| BTC (BARC) Pump | — | With MACRD Pump, Direct Drain[1] |
| ITC (Intermediate Coating) Pump | — | With MACRD Pump, Direct Drain, CCSS[1] |
| DEV PTD Nozzle | — | MGP Nozzle[1] |
| DEV PTD Rinse Nozzle | — | ADR Nozzles[1] |
| DEV NTD Nozzle | — | IDN Nozzle, CCSS[1] |
| PIR (Post-Imaging Resist) Nozzle | — | IDR Nozzle, CCSS[1] |
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