Comparison ledger
Hitachi 1305 BSG 3, Tokyo Electron Clean Track Lithius i+, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1305 BSG 3Hitachi | Clean Track Lithius i+Tokyo Electron |
|---|---|---|
| OEM | Hitachi | Tokyo Electron |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Hitachi 1305 BSG 3 | Tokyo Electron Clean Track |
| Specifications | ||
| Configuration | — | 193nm Immersion[1] |
| Manufacturer | — | Tokyo Electron[1] |
| Model | — | Clean Track Lithius i+[1] |
| Equipment type | — | coater/developer semiconductor manufacturing system[1] |
| Asset number | — | 74232[2] |
| Last confirm date | — | September 27, 2023[2] |
Plan your fab
Building a Wet Processing / Clean process? Get a complete equipment list.
Open the fab equipment planner →