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Comparison ledger

F50-UVversusHRP 340 Surface

Filmetrics F50-UV, KLA HRP 340 Surface, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
F50-UVFilmetrics
OEMFilmetricsKLA
CategoryMetrology & InspectionMetrology & Inspection
Wafer size8"8"
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyFilmetrics F50-UVKLA HRP 340
Specifications
VendorFilmetrics[1]—
ModelFilmetrics F50-UV[1]HRP 340 Surface[3]
Measurement methodspectroscopic reflectometry[2]—
Functionthin-film thickness and optical characteristics measurement[1]—
Automated stageyes[1]—
Sample sizeup to 8 inches in diameter[1]—
Substrate size~5 mm × 5 mm to 200 mm diameter[2]—
Thickness measurement range5 nm – 40 µm[2]—
Minimum thickness to measure n and k50 nm[2]—
Wavelength range190–1100 nm[2]—
Spot size1.5 mm[2]—
Light sourcedeuterium + tungsten-halogen (dual light source; may choose one or both lamps)[2]—
Measurement results visualization2D and 3D[2]—
Measurement results visualisation2D and 3D[2]—
Wafer handlingUp to 8"[1]—
Sample stageFully automated[1]—
Measurement rateup to 2 points per second[1]—
Configuration—Bad Load port[3]
OS—Windows XP[4]
Vertical Range—0-131 um[4]
Style Force—0.05-15 mg[4]
Stylus—2.0 um / 60[4]
Wafer size—PSL Standard 8 inch Wafer (9400 A Standard)[4]
OEM—KLA[3]
Category—Metrology & Inspection[5]
Model designation—HRP340[6]
Description—Surface profilometer[3]
Status—Sold[6]
Vintage—2007[6]
Condition—Excellent[6]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]uwaterloo.cauwaterloo.ca
  2. [2]confluence.nanofab.ualberta.caconfluence.nanofab.ualberta.ca
  3. [3]inventory listing
  4. [4]inventory listing
  5. [5]waferpedia.comwaferpedia.com
  6. [6]jenesisequipment.comjenesisequipment.com