Comparison ledger
EV Group 101, SUSS MicroTec MA 200 Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 101EV Group | MA 200 MaskSUSS MicroTec |
|---|---|---|
| OEM | EV Group | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 101 | SUSS MicroTec MA 200 |
| Specifications | ||
| OEM | EV Group[1] | SUSS[4] |
| Model | 101[1] | MA 200[4] |
| Equipment name | EVG 101 Spray Coater[1] | — |
| NEMO ID | evgspraycoat[1] | — |
| Training required | EVG 101 Training[1] | — |
| Training duration | 1.50 hours[1] | — |
| Processing technique | Resist Spray Coat (manual)[1] | — |
| Cleanliness | "All"[1] | — |
| Location | SNF Paul G Allen L107 Cleanroom[1] | — |
| Wafer diameter (substrate size) | up to 300 mm[2] | — |
| Available modules | Spin coat / OmniSpray® / develop[2] | — |
| Wafer handling options | Bowed / warped / thin wafer handling, edge handling[2] | — |
| Dispense options | Various resist dispense pumps covering viscosities up to 52000 cP; constant pressure dispense systems; EBR / BSR / pre-wet / bowl wash / liquid priming[2] | — |
| Processing technique (at SNF) | Resist Spray Coat (manual)[3] | — |
| Cleanliness group (at SNF) | "All"[1] | — |
| Configuration | — | With CIC1000 lamp housing[4] |
| Hardware | — | Intel Standard[4] |
| Operation | — | Semi-automatic[4] |
| Wafer sizes | — | 6 inch, 8 inch[4] |
| Optics | — | UV400/cont/W-200[4] |
| Sensor | — | 365/405 dual range[4] |
| Lamp housing | — | CIC1000[4] |
| Computer hardware | — | Intel Standard[4] |
| Alignment system | — | SUSS AL3000 Auto Align[4] |
| Microscope | — | DVM8 with Sony cameras, L25X Objective (qty 2)[4] |
| Mask holder | — | with Guard[4] |
| Field Expanders | — | Yes[4] |
| Wafer sizes (from other listing) | — | 6, 8 inch[5] |
| Equipment type | — | Mask Aligner[4] |
| Wafer size | — | 8 inch[4] |
Plan your fab
Building a Lithography process? Get a complete equipment list.
Open the fab equipment planner →