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Comparison ledger

300 Bake Plateversus12-2P-CP

CEE 300 Bake Plate, YES 12-2P-CP, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMCEEYES
CategoryThermal / DiffusionThermal / Diffusion
Wafer size300mm300mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyCEE 300 Bake PlateYES 12-2P-CP
Cited variants
  • Apogee Benchtop 300 Bake Plate[1]
  • Apogee Flange Mount 300 Bake Plate[1]
  • Apogee X-Pro 300 Bake Plate[1]
Specifications
Wafer sizeup to 300mm wafer[3]300 mm wafers[2]
SoftwareInternal OS[3]—
Voltage208V[3]—
Max Substrate Size300mm round or 12" x 12" square[1]—
Min Substrate Size4 inch round[1]—
Max Temperature300°C (400°C optional)[1]—
Temperature Resolution0.1°C[1]—
Temperature Uniformity±0.3% across working area[1]—
Smart Pin Height Range0-19 mm[1]—
Weight (machine only)146 lb (66.2 kg)[4]—
Dimensions18" H x 18.75" W x 26.25" D[4]—
Power3100-4100 watts[4]—
Exhaust Port2" (50.8mm) OD[4]—
Model designation—12-2P-CP[2]
Series—YES-PB Series / 450PB Series[2]
Load type—manual load[5]
Application scope—MEMS and semiconductor process applications[6]
Cooling package—Air-only cooling package; no water[2]
Airflow—Vertical laminar airflow[2]
High vacuum—10-6[2]
Maximum temperature—up to 450°C[2]
Interface—touch screen interface[6]
Tool type—manual-load high-temperature cure oven[5]
Process applications—MEMS and semiconductor process applications[5]

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Sources (6)Every fact above is drawn from these public sources
  1. [1]costeffectiveequipment.comcosteffectiveequipment.com
  2. [2]web.archive.orgweb.archive.org
  3. [3]inventory listing
  4. [4]sistemtechnology.comsistemtechnology.com
  5. [5]web.archive.orgweb.archive.org
  6. [6]web.archive.orgweb.archive.org