Waferpedia

Comparison ledger

1000 Hot Plateversus1500EXL

CEE 1000 Hot Plate, Heller 1500EXL, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
1500EXLHeller
OEMCEEHeller
CategoryThermal / DiffusionThermal / Diffusion
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyCEE 1000 Hot PlateHeller 1500EXL
Cited variants—
Specifications
Configuration4"[2]—
TypeHot Plate[2]—
Wafer Size4 inch[2]—
Series—EXL Series[1]
Heating zones—Five heating zones[1]
Cooling zones—One internal cooling zone[1]
Profiling—Five thermocouple profiling[1]
Line speed—Up to 28 inches (70 cm) per minute[1]
Airflow improvement—25% higher airflow compared to previous designs[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]inventory listing
  3. [3]semiconductoronline.comsemiconductoronline.com