Waferpedia

Comparison ledger

017-0024-01 PrealignerversusMA6/MA4

Brooks 017-0024-01 Prealigner, SUSS MicroTec MA6/MA4, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
MA6/MA4SUSS MicroTec
OEMBrooksSUSS MicroTec
CategoryLithographyLithography
Wafer size—wafers up to 4″ (MA4) or 6″ (MA6); also 1 cm² pieces
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyBrooks 017-0024-01 PrealignerSUSS MicroTec MA6/MA4
Cited variants—
Specifications
Exposure resolution—< 1 µm[1]
Alignment accuracy—Topside – 500 nm[1]
Exposure modes—Hard contact, soft contact, proximity, flood[1]
Spectral range—365 nm – 405 nm[1]
Substrate accommodation—1 cm² pieces and wafers up to 4″ (MA4) or 6″ (MA6)[1]
Uniformity—+/- 5% over exposure area[1]
Image capture—CCD camera and monitor[1]

Plan your fab

Building a Lithography process? Get a complete equipment list.

Open the fab equipment planner →
Sources (1)Every fact above is drawn from these public sources
  1. [1]ece.utoronto.caece.utoronto.ca