Comparison ledger
Brooks 017-0024-01 Prealigner, Canon FPA 3000 i 4, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 017-0024-01 PrealignerBrooks | FPA 3000 i 4Canon |
|---|---|---|
| OEM | Brooks | Canon |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Brooks 017-0024-01 Prealigner | Canon FPA 3000 |
| Cited variants | — |
|
| Specifications | ||
| Configuration | — | Intensity 6530 ( W/m2 ) LPA – 0.846[2] |
| Manufacturer | — | Canon[2] |
| Model | — | FPA 3000 i 4[2] |
| Wafer size | — | 6 inch[2] |
| Type | — | Fine Pattern Aligner[1] |
| Software version | — | V4.09A.08[1] |
| Reticle size | — | 6" square t=0.25"[3] |
| Reticle material | — | Quartz[3] |
| Pattern material | — | 2 layer Cr, 3 layer Cr[3] |
| Pellicle frame | — | Pattern Side Only[3] |
| Wafer sizes | — | 4" thru 8" SEMI Standard, JEIDA, Notch / Flat[3] |
| Projection magnification | — | 1/5 X[3] |
| Numerical aperture | — | .45 - .63[3] |
| Field size | — | 22x22 17x26[3] |
| Exposure light | — | Kr F(365nm)[3] |
| Light source | — | 2.0KW Super High Pressure Hg Lamp[3] |
| Intensity | — | 6500 W/m2[3] |
| Uniformity | — | 1.0[4] |
| Resolution | — | <0.35μm[3] |
| Depth of focus | — | >.8μm[3] |
| Image field deviation | — | <.5μm[3] |
| Distortion | — | <±0.05μm[3] |
| Reticle rotation accuracy | — | <±0.01μm on wafer[3] |
| Reticle rotation repeatability | — | <0.02μm) on wafer[3] |
| Wafer alignment | — | <0.06μm mean + 3sigma[3] |
| Focus repeatability | — | <0.10μm (3sigma)[3] |
| Leveling repeatability | — | <7ppm (3sigma)[3] |
| Minimum compensation range | — | >100ppm[3] |
| Step accuracy | — | <0.04μm (3sigma)[3] |
| Scaling | — | <±0.5ppm[3] |
| Orthogonality | — | <±0.5ppm[3] |
| Throughput | — | >83 wafers/hour Φ6", 22mm, 32 shots[3] |
| Model year | — | 1998[4] |
| Serial number | — | 605669[4] |
| Illumination source | — | 365[4] |
| Projection ratio | — | 5:1[4] |
| Field | — | 22 x 22[4] |
| Alignment accuracy | — | 60[4] |
| Stage type | — | ABS[4] |
Plan your fab
Building a Lithography process? Get a complete equipment list.
Open the fab equipment planner →