Comparison ledger
Axcelis 200 ACU, Tegal 6500 HRe-, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 200 ACUAxcelis | 6500 HRe-Tegal |
|---|---|---|
| OEM | Axcelis | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Axcelis NV GSD 200 | Tegal 6500 HRe- |
| Cited variants | — | |
| Specifications | ||
| Configuration | Parts Machine[2] | — |
| Manufacturer | Axcelis[2] | — |
| Model | 200 ACU[2] | — |
| Tool type | Asher[2] | — |
| Wafer size | 200mm[4] | — |
| Serial number | AU6A356AH[4] | — |
| Computer system | M 200 PC, M 200[5] | — |
| Part number | SC 4572 A[5] | — |
| Volts | 208[5] | — |
| Amps | 30[5] | — |
| Equipment type | Asher[2] | — |
| Wafer configuration | 8 inch[3] | — |
| System type | — | Dual Frequency Etch System Series[1] |
| Tool architecture | — | Hosts a cluster of plasma etching tools[1] |
| Etch chamber configuration | — | One or two etching chambers[1] |
| Wafer processing modes | — | Serial or parallel wafer processing[1] |
| Loading ports | — | Single or dual loading ports[1] |
| Plasma generation | — | Dual frequencies for high-density, capacitively coupled plasma (CCP) generation[1] |
| Plasma confinement | — | Magnetic plasma confinement[1] |
| Etch precision | — | Down to the sub-micron level[1] |
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