Comparison ledger
Axcelis 17099370 Outer strike plate, Axcelis NV 8200, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 17099370 Outer strike plateAxcelis | NV 8200Axcelis |
|---|---|---|
| OEM | Axcelis | Axcelis |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | — | 200mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Axcelis 17099370 Outer strike plate | Axcelis NV 8200 |
| Specifications | ||
| Configuration | Used with Axcelis GSD 200[1] | Gas lines:[2] |
| Energy config. | — | from 3 to 250keV (single); up to 750 keV (triple)[2] |
| Wafer size | — | Wafer size 200mm with holders for different wafers sizes[2] |
| Dose | — | > 1E11at/cm²[2] |
| Beam current | — | I < 1mA[2] |
| Ion sources | — | 3 ion sources with dual vaporizer on each source[2] |
| Magnet | — | Dipole magnet 90° - Buckley Systems – de 0 a 75 AMU in full charge[2] |
| Cryo compressor | — | CTI Cryogenics 9600[2] |
| Make | — | Axcelis[3] |
| Model | — | NV 8200[3] |
| Wafer Sizes | — | 8 inch[4] |
| Process gas lines | — | 4 process gas lines (BF2/PH3/AsH3/Hydrogen)[2] |
| Gas line | — | 1 gas line (Argon)[2] |
| Mass range | — | 0 to 75 AMU in full charge[2] |
| Target positioning / scanning system | — | Parallel beam; electrostatic angle correction programmable; tilt 0°-60°[2] |
| End station | — | Flat/notch alignment with buffet cassette (3 cassette positions); 3 axis robotic; Pick & Place system[2] |
| Turbo pumps | — | Edwards STP 1003C for Source; Pfeiffer HiPace 300 + Pfeiffer TPH 1201 P for Beam Line[2] |
| Rough pumps | — | Adixen A 103 P for Source; Adixen A 103 P for Beam Line; Alcatel/Adixen ADS 602 P for End Station[2] |
| Clamp type | — | Electrostatic clamp[2] |
| Software | — | SPARC V[2] |
| Soft | — | SPARC V[2] |
| Non-functional modules | — | PC remote[2] |
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