Waferpedia

Comparison ledger

Twinscan AT 1100versus017-0146-01 Prealigner

ASML Twinscan AT 1100, Brooks 017-0146-01 Prealigner, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMASMLBrooks
CategoryLithographyLithography
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyASML TwinscanBrooks 017-0146-01 Prealigner
Specifications
Configuration50/60 Hz[1]—
Voltage230 V[1]—
Phase3 Phase[1]—
Light source193 nm ArF laser[2]—
Projection opticsCarl Zeiss Star Lith 1100, numerical aperture 0.75[2]—
Resolution100 nm[2]—
Overlay accuracy<20 nm at full throughput[2]—
Throughput93 wafers per hour for 300 mm wafers[2]—
Laser repetition rate4 kHz[2]—
Dual wafer stageYes[2]—
Wafer sizes8 inch / 200 mm, 12 inch / 300 mm[1]—
Power electrical50/60 Hz, 230 V, 400 VAC, 3 Phase[1]—
Laser modelCymer NL 7600 A[1]—
Included accessoriesHDD & Software[1]—

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]his-tek.comhis-tek.com