Comparison ledger
Applied Materials VIISta 80 High Current, Varian 160 XP, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | VIISta 80 High CurrentApplied Materials | 160 XPVarian |
|---|---|---|
| OEM | Applied Materials | Varian |
| Category | Ion Implantation | Ion Implantation |
| Wafer size | Laser Wafer Mapping | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials VIISTA | Varian 160 XP |
| Cited variants | — |
|
| Specifications | ||
| Line Voltage | 3 Phase, 208 V[2] | — |
| Line Frequency | 50 / 60 Hz[2] | — |
| UPS | EATON 9 PX 3000[2] | — |
| Configuration | Chamber A - DPN (Aluminum)[2] | — |
| He MFC Size | Optional[2] | — |
| N 2 MFC Size | 1 slm (for 500 sccm in the recipe)[2] | — |
| Type | UES with Turbo Foreline[2] | — |
| Cassette Stage | 200 mm (8") Standard[2] | — |
| Wafer size | Laser Wafer Mapping[2] | — |
| Lamp Colors | Red, Orange, Green[2] | — |
| Chiller | Affinity RAA 012 K CE 55 CBC[2] | — |
| DI Cart | VIISta 80 with B-Pure Filters[2] | — |
| Manufacturer | Applied Materials / Varian[3] | — |
| Model | VIISta 80[3] | — |
| Wafer Size | 200 mm (8 inch)[2] | — |
| Gas Box | 5 sticks, HP and SDS 2 in use; He MFC optional; N2 MFC 1 slm[2] | — |
| Loadlock / Cassette | 2 chambers, UES with Turbo Foreline; Cassette Stage 200 mm (8") Standard with Laser Wafer Mapping[2] | — |
| Vintage | 2000[2] | — |
| Laser Wafer Mapping | Yes[2] | — |
| Loadlock Chambers | 2, Type UES with Turbo Foreline[2] | — |
| Year of Manufacture | 2000[2] | — |
| SMIF Version | 200 mm SMIF[4] | — |
| Manufacturing Date | 2000-12-01[4] | — |
| Configuration (160 XP Ion variant) | — | 150mm High Current IMP[1] |
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