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Comparison ledger

Sigmameltec MRC 9000 Maskversus1000P

Applied Materials Sigmameltec MRC 9000 Mask, YES 1000P, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
Sigmameltec MRC 9000 MaskApplied Materials
OEMApplied MaterialsYES
CategoryWet Processing / CleanWet Processing / Clean
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones—1998 Acquisition
Control system——
Generation——
FamilyApplied Materials Sigmameltec MRC 9000 MaskYES 1000P
Specifications
ConfigurationIn the Chemical Supply Unit, one Filter is Dislodged[1]Parallel plate[3]
SensorUnaffected[1]—
Chemical Supply UnitPresent[1]—
O3 Water Supply unitPresent[1]—
Power BoxPresent[1]—
Vacuum Pump, Chiller, Critical PartsPresent[1]—
Main Tool (Dry Clean Unit)Present[1]—
Main Tool (Wet Clean Unit)Present[1]—
Model—1000P[2]
System type—Plasma cleaning system[2]
Shelf configuration—Four 16 x 16 inch shelves[2]
Total capacity—1024 square inches[2]
Control system—PLC driven with plain English real time process readout and diagnostics in the event of system abort[2]
Number of shelves—4[2]
Shelf size—16 x 16 inches[2]
Power—1000 W[3]
Operation modes—Active, RIE, Downstream[2]
Sample size range—From smallest semiconductor chip to large flat panels[2]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]web.archive.orgweb.archive.org
  3. [3]semistarcorp.comsemistarcorp.com