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Precision Implant xR 200 S High Currentversus0216 7696, E 11368072 ESC

Applied Materials Precision Implant xR 200 S High Current, Varian 0216 7696, E 11368072 ESC, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMApplied MaterialsVarian
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials xR 200 SVarian 0216 7696, E 11368072 ESC
Specifications
ConfigurationChamber with Liners Turbo Pump (2)[1]Platen ADV-S Type[3]
OEMApplied Materials[1]—
ModelPrecision Implant xR 200 S[1]—
CategoryIon Implantation[2]Ion Implantation[4]
TypeHigh Current Ion Implanter[2]ESC Platen ADV-S Type[3]
Wafer size8 inch[1]—
Vacuum & pumpingChamber with Liners Turbo Pump (2); Leybold Turbo Mech Parts; 8500 Cryo Pump (2); Backing Pumps (3); Cryo Pumps (2); Cryo Compressor Energy Range Acceleration Drift / Accel[2]—

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Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]inventory listing
  4. [4]waferpedia.comwaferpedia.com