Waferpedia

Comparison ledger

0041-39086 ESC PartversusNE 950

Applied Materials 0041-39086 ESC Part, Ulvac NE 950, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0041-39086 ESC PartApplied Materials
NE 950Ulvac
OEMApplied MaterialsUlvac
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—Ulvac NE 950
Cited variants—
  • NE 950 EX ICP[1]
  • NE 950 ICP-RIE[1]
Specifications
Manufacturer—Ulvac[2]
Model—NE 950[2]
Category—Etch[3]
Tool type—ICP-RIE (Inductively Coupled Plasma - Reactive Ion Etch) system[3]
Wafer description—chamber described for 2" to 12" wafers[3]
Process type—ICP-RIE (Inductively Coupled Plasma - Reactive Ion Etch)[3]
Wafer size—2" to 12" wafers[3]

Plan your fab

Building a Etch process? Get a complete equipment list.

Open the fab equipment planner →
Sources (3)Every fact above is drawn from these public sources
  1. [1]waferpedia.comwaferpedia.com
  2. [2]Equipment inventory listing
  3. [3]waferpedia.comwaferpedia.com