Waferpedia

Comparison ledger

0041-39086 ESC PartversusWS 820 L

Applied Materials 0041-39086 ESC Part, SCREEN WS 820 L, side by side. Every value shown is drawn from the cited encyclopedia entries.

LinkedIn X Email
Side-by-side comparison of selected equipment models
Attribute
0041-39086 ESC PartApplied Materials
WS 820 LSCREEN
OEMApplied MaterialsSCREEN
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones—1996 Vintage · 1997 Vintage
Control system——
Generation——
Family—SCREEN WS 820 L
Specifications
Configuration—SiN Wet Etching[1]
Chemical—H3PO4 , IPA , HF[1]
PLC (Loader / Unloader)—Mitsubishi A3A CPU P21[1]
Olifra—wafer flatzone[1]
Main PC—Mitsubishi/LM (hard disket OK)[1]
Signal Tower—3 color (GYR) Patlite lamp type[1]
Phase—3 Phase, 208V, 170a, 100V[1]
Left/ Right Stepping Motor (Oriental—VEXTA A 6259)[1]
Up/Down Stepping Motor (Oriental—VEXTA PK 596 H[1]
Wafer Size—8 inch[1]
Process—SiN wet etching, nitride strip[1]
Chemicals—H3PO4, IPA, HF[1]
Transfer Type—Rear type transfer flow[1]
IPA Dryer Fire Extinguisher—Yes[1]
PLC—Mitsubishi A3A CPU P21[1]
Wafer Flatzone—Olifra[1]
Front Carrier Detector Sensor—Yes[1]
Power—3 Phase, 208V, 170A, 100V[1]
Carrier Loading—2 carrier loading (stocker 8 carrier loading)[1]
Stepping Motors (Left/Right)—Oriental VEXTA A 6259[1]
Stepping Motors (Up/Down)—Oriental VEXTA PK 596 H[1]
Measuring Units—H3PO4 measuring tank, DIW measuring tank, H3PO4 DIW spiking pump, HF measuring tank[1]
Resistivity Meter—DKK AQ 10 (Final Rinse)[1]
Circulation Heater—In-Line Heater[1]
Circulation Pump—FS 30 HT 2[1]
Circulation Filter—High Temp Filter[1]
Aspirator Drain—Yes[1]
Pump—FS 30 HT 2[1]
Filter—High Temp Filter[1]
0041-39086 ESC Part entryWS 820 L entryAsk about these tools →Share experience with this comparison →

Plan your fab

Building a Etch process? Get a complete equipment list.

Open the fab equipment planner →
Sources (1)Every fact above is drawn from these public sources
  1. [1]inventory listing