Waferpedia

Comparison ledger

0020 17485 Partversus1224

Applied Materials 0020 17485 Part, YES 1224, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 17485 PartApplied Materials
1224YES
OEMApplied MaterialsYES
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 17485 PartYES 1224
Cited variants—
Specifications
ConfigurationStrap, RF Out 2 Balanced Coil Match, Hdp[2]—
Model—YES-1224[1]
Equipment type—Chemical vapor deposition system[1]
Application—Silane coating for MEMS device packaging[1]
Process characteristic—Controls the functionalization process so results are precisely reproducible, run-to-run[3]
Process Type—Chemical vapor deposition (silane coating)[1]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]web.archive.orgweb.archive.org
  2. [2]inventory listing
  3. [3]web.archive.orgweb.archive.org